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Photomask Japan
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Start Date 13-Apr-2010 End Date 15-Apr-2010
Industry Focus Electronics & Electrical, Industrial Supplies Event Profile Photomask Japan 2010 is the 17th international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. Exhibitior Profile Profile of the Exhibitors are: Equipments for Photomasks, process and equipments for developing, etching, cleaning etc., Photomask Writing Tools and Technologies, Metrology Tools and Technologies, Inspection Tools and Technologies, Repairing Tools and Technologies, Mask Data Preparations, EDA and DFM for Photomasks etc. Visitor's Profile The target of the Visitors are: Manufacturers, Importers & exporters of glasses, sunglasses, lenses & other related products & General Public.
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